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Photopolymers: Photoresist Materials, Processes and Applications

After reading this book, my first thought was that it is too “chemical” for the average physicist. The first half is filled with structural formulas, chemical reactions and long, unfamiliar chemical names. It seems to me that chemistry and processes are just listed but not explained well enough for the unfamiliar reader. The second part should be more interesting for someone working with photolithography applications. In that respect, the author makes an introduction to lithographic processes, nano-imprint technology and holographic applications.

I don’t think that this is a good first book for a physicist interested in photolithography and corresponding photosensitive materials. This book is probably a better fit for a chemist who wants to learn the physical principles of optical lithographic techniques.

Review by Dejan Pantelić, Institute of Physics, Belgrade, Serbia

The opinions expressed in the book review section are those of the reviewer and do not necessarily reflect those of OPN or OSA.

Publish Date: 16 April 2015

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