The telecom boom of the late 1990s helped drive a revolution in thin-film technology. As a result, new deposition techniques have been developed that can withstand environmental challenges such as humidity and thermal stress.
Log in or Become a member to view the full text of this article.
This article may be available for purchase via the search at www.osapublishing.org.
OSA Members get the full text of Optics & Photonics News, plus a variety of other member benefits.