Thank You, Editors
We are happy to announce that the following individuals were recently appointed as new editors: Applied Optics: David Haefner, U.S. Army Night Vision and Electronic Sensors Directorate, USA (E&L Notes Editor); Adriana Szeghalmi, Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF, Germany. JOSA B: Jiefei Chen, Southern University of Science and Technology, China. Optica: Pierre Berini, University of Ottawa, Canada; Juliet T. Gopinath, University of Colorado at Boulder, USA; Amr Helmy, University of Toronto, Canada; Anna Sytchkova, ENEA Optical Coatings Lab, Italy. Optics Express: John Koshel, University of Arizona, USA (Deputy Editor).
We thank the following editors for agreeing to serve a second term: Applied Optics: Songnian Fu, Huazhong University of Science and Technology, China; John Heebner, Lawrence Livermore National Laboratory, USA; Sanshui Xiao, Technical University of Denmark, Denmark; Chi Xiong, IBM TJ Watson, USA. JOCN: Antonio García-Zambrana, Universidad de Málaga, Spain. Optica: Klaus Petermann, Technische Universität Berlin, Germany; Aleksei M. Zheltikov, Texas A&M University, USA, and M.V. Lomonosov Moscow State University, Russia. Optical Materials Express: Victor Ya. Zyryanov, Kirensky Institute of Physics, Russia.