RAPID Lithography: New Photoresists Achieve Nanoscale Resolution

John T. Fourkas

Over the past decade, researchers have shattered the traditional view of the diffraction limit. Using new techniques, they have obtained resolution far smaller than the wavelength of light excitation or emission. Similar concepts are now being applied to photolithography, making it possible to create nanoscale features in a photoresist using visible or near-infrared light.

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Publish Date: 01 June 2011


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