Optical Lithography in the Extreme UV

Stephen P. Renwick, David Williamson, Kazuaki Suzuki and Katsuhiko Murakami

As the number of transistors on a chip continues to increase, the industry’s shrinking feature size is outstripping even the best efforts of optical engineers. Extreme ultraviolet lithography can lead to a more-than-tenfold decrease in wavelength, translating to a startling leap in performance.

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Publish Date: 01 October 2007


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