Colin W.T. Knight
Optical microlithography has been used for over 30 years as the preferred method of image formation in the manufacture of silicon devices and other semiconductor components. Its demise as the premier imaging technology, was predicted at about 1 μm feature sizes by proponents of alternative imaging technologies and others who underestimated the ability of optical tool manufacturers to improve optical and mechanical system performance to the degree necessary to support the production of increasingly complex devices with ever smaller features.
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Publish Date: 01 October 1990
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