Strategies Toward Sub-0.25 µm Lithography

Bruce Smith discusses various issues relating to sub-0.25 µm lithography, including source wavelength, illumination, masking, and materials.

Become a member of OSA or log in to view the full text of this article.

OSA Members get the full text of Optics & Photonics News, plus a variety of other member benefits.


Add a Comment

comments powered by Disqus