Femtosecond-Laser-Assisted Microstructuring of Silicon Surfaces

James E. Carey, Catherine H. Crouch and Eric Mazur

Femtosecond-laser-assisted chemical etching is being used to microstructure silicon surfaces. The technique offers new opportunities in areas including photodetector, sensor and display applications.

Log in or become a member to view the full text of this article.


This article may be available for purchase via the search at Optica Publishing Group.
Optica Members get the full text of Optics & Photonics News, plus a variety of other member benefits.

Add a Comment