Angela Davies, Charles Tarrio, and Chris Evans
Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High-performance optical systems demand increasingly tighter tolerances, and tighter tolerances drive the need for ever better metrology. Aspheric optics, shorter wavelengths, and resonant systems all enable high performance: they also make the metrologist’s life more difficult. Two of the recent drivers of tighter optical tolerances have been extreme ultraviolet lithography (EUVL) and the Laser Interferometric Gravitational Wave Observatory (LIGO).
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