High Frequency Probing of Nanometric Resolution Using Near-Field Optical Heterodyne Technology
We have developed a novel optical technique that allows for injection of high frequency millimeter wave signals up to 100 GHz to a specific local area of modern ultrahigh speed semiconductor devices and integrated circuits. This high frequency probing of nanometric resolution equips one with the capability to pinpoint origin of dynamic processes in devices, their spatial extent and their relation to interface and surface parameters, structural inhomogeneities and imperfections. The technique thus enables the experimentalists to look ever more closely into the details of ultrafast phenomena occurring in today's ultrasmall devices and circuits.
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